Photronics Extends Capability with the First Installation of a Merchant Multi-beam Mask Writer in the United States
Photronics (Nasdaq: PLAB) has announced the installation of the first merchant multi-beam mask writer in the United States at their Boise, Idaho facility. This technological advancement marks a significant milestone in photomask production capabilities.
The new multi-beam tool features a parallel writing engine that delivers enhanced speed and performance for U.S.-built merchant photomask products. The technology enables the production of complex IC mask shapes, particularly for critical curvilinear designs, and can write the finest resolution EUV and nanoimprint masks.
The installation strengthens Photronics' position as the only U.S.-based high-end mask merchant facility, supporting both U.S. Government Trusted and commercial advanced photomask applications.
Photronics (Nasdaq: PLAB) ha annunciato l'installazione del primo sistema multi-beam per la scrittura di maschere commerciale negli Stati Uniti, presso la loro struttura di Boise, Idaho. Questo progresso tecnologico rappresenta una tappa fondamentale nelle capacit脿 di produzione di fotomaschere.
Il nuovo strumento multi-beam 猫 dotato di un motore di scrittura parallela che garantisce maggiore velocit脿 e prestazioni per i prodotti di fotomaschere commerciali realizzati negli Stati Uniti. La tecnologia consente la produzione di forme complesse di maschere per circuiti integrati, in particolare per design curvilinei critici, ed 猫 in grado di scrivere maschere EUV e nanoimprint con la massima risoluzione.
Questa installazione rafforza la posizione di Photronics come unica struttura commerciale di alto livello per maschere basata negli Stati Uniti, supportando sia applicazioni avanzate di fotomaschere per il Governo degli Stati Uniti sia per il mercato commerciale.
Photronics (Nasdaq: PLAB) ha anunciado la instalaci贸n del primer escritor de m谩scaras multi-haz comercial en Estados Unidos, en su instalaci贸n de Boise, Idaho. Este avance tecnol贸gico marca un hito importante en las capacidades de producci贸n de fotom谩scaras.
La nueva herramienta multi-haz cuenta con un motor de escritura paralelo que ofrece mayor velocidad y rendimiento para productos comerciales de fotom谩scaras fabricados en EE.UU. La tecnolog铆a permite la producci贸n de formas complejas de m谩scaras para circuitos integrados, especialmente para dise帽os curvil铆neos cr铆ticos, y puede escribir m谩scaras EUV y nanoimpresi贸n con la m谩xima resoluci贸n.
La instalaci贸n fortalece la posici贸n de Photronics como la 煤nica instalaci贸n comercial de alta gama para m谩scaras con base en EE.UU., apoyando tanto aplicaciones avanzadas de fotom谩scaras comerciales como de confianza del Gobierno de EE.UU.
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Photronics (Nasdaq聽: PLAB) a annonc茅 l'installation du premier syst猫me d'茅criture de masques multi-faisceaux commercial aux 脡tats-Unis, dans leur site de Boise, Idaho. Cette avanc茅e technologique repr茅sente une 茅tape majeure dans les capacit茅s de production de photomasques.
Le nouvel outil multi-faisceaux dispose d'un moteur d'茅criture parall猫le offrant une vitesse et des performances accrues pour les produits de photomasques commerciaux fabriqu茅s aux 脡tats-Unis. Cette technologie permet la production de formes complexes de masques pour circuits int茅gr茅s, notamment pour les designs curvilignes critiques, et peut 茅crire des masques EUV et nanoimpression avec la r茅solution la plus fine.
Cette installation renforce la position de Photronics en tant que seul site commercial de masques haut de gamme bas茅 aux 脡tats-Unis, soutenant 脿 la fois les applications avanc茅es de photomasques pour le gouvernement am茅ricain et le secteur commercial.
Photronics (Nasdaq: PLAB) hat die Installation des ersten kommerziellen Multi-Beam-Maskenschreibers in den USA an ihrem Standort in Boise, Idaho, bekannt gegeben. Dieser technologische Fortschritt stellt einen bedeutenden Meilenstein in den Produktionsm枚glichkeiten von Fotomaschinen dar.
Das neue Multi-Beam-Ger盲t verf眉gt 眉ber eine parallele Schreibtechnik, die eine verbesserte Geschwindigkeit und Leistung f眉r in den USA hergestellte kommerzielle Fotomaschinenprodukte bietet. Die Technologie erm枚glicht die Herstellung komplexer IC-Maskenformen, insbesondere f眉r kritische kurvige Designs, und kann Masken mit h枚chster Aufl枚sung f眉r EUV und Nanoimprint schreiben.
Die Installation st盲rkt die Position von Photronics als einziges in den USA ans盲ssiges High-End-Maskenhandelsunternehmen und unterst眉tzt sowohl vertrauensw眉rdige Anwendungen der US-Regierung als auch kommerzielle fortschrittliche Fotomaschinenanwendungen.
- First merchant multi-beam mask writer installation in the U.S., establishing technological leadership
- Enhanced capability for complex IC mask shapes and critical curvilinear designs
- Improved production speed and performance through parallel writing engine
- Ability to support most advanced U.S. photomask needs with EUV and nanoimprint mask capabilities
- None.
BROOKFIELD, Conn., Aug. 08, 2025 (GLOBE NEWSWIRE) -- (Nasdaq: PLAB), a worldwide leader in photomask technologies and solutions, announced the installation of a new multi-beam tool in its facility in Boise, Idaho expanding Photronics technological leadership.
鈥淭his installation marks the first multi-beam writer in production for the merchant market in the U.S. extending Photronics leadership in support of U.S. Government Trusted and commercial advanced photomask applications in the U.S. and globally,鈥� said CEO George Macricostas. 鈥淭he multibeam tool leverages a massively parallel writing engine to deliver unprecedented speed and performance for U.S. built merchant photomask products. We look forward to collaborating with our customers to deploy this capability to improve their time to market and end-product IC performance. Photronics continues to build on our U.S. based flagship IC technology center to enhance capabilities of the only U.S. based high end mask merchant facility.鈥�
Added CTO Chris Progler, 鈥淚n addition to writing speed, the multi-beam platform enables highly complex IC mask shapes to be written such as those found in critical curvilinear style designs. By enabling production of these new IC design forms, it creates opportunities for our U.S. and global customers to deliver higher performing IC products faster. This multibeam system is also capable to write the finest resolution EUV and nanoimprint masks allowing Photronics to directly support the most advanced U.S. photomask masks needs from our U.S. based technology center. We are engaged with multiple customers now to pilot and qualify this unique U.S. merchant capability.鈥� 聽聽
About Photronics
is a leading worldwide manufacturer of integrated circuit (IC) and flat panel display (FPD) High precision quartz plates that contain microscopic images of electronic circuits, photomasks are a key element in the IC and FPD manufacturing process. Founded in 1969, Photronics has been a trusted photomask supplier for over 56 years. The company operates 11 strategically located in Asia, Europe, and North America. Additional information can be accessed at .
For Further Information:
Ted Moreau
VP, Investor Relations
469.395.8175
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